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PLASMA CUBE 400 - PVD System for Deposition of ta-DLC by Pulsed Arc Plasma

This PVD Vacuum Plant allows the generation of various types of surface deposition coatings (DLC ta-C, TiN, ZrN) with hardness up to 5500 HV (100% carbon), making it flexible for many production purposes such as the medical, automotive, aerospace and mechanical sectors.

FEATURES OF THE MACHINE:

  • Carbon Pulsed Arc Plasma Source at Low Temperature, max 100°C (Carbon Source)

  • Titanium Arc Plasma Source (Titan Source)

  • Ion Plasma Source (Ion Source)

  • Bias Substrate (BIAS)

  • Remote table with a trolley (68 Axes Mobile Carousel, Ø400mm)

  • Working area - Ø: 500mm H: 150mm

FEATURES OF THE PROCESS & TECHNOLOGY:

 

Diamond coatings of Diamond-like Carbon (DLC)

  • Reduce friction.

  • Reduce wear.

  • Are made from graphite and energy.

  • Are made without toxic byproducts or harmful waste.

  • Can be deposited on almost anything that can be put in a vacuum.

DLC films are generally amorphous (i.e have no dominant crystalline lattice structure) and consist of a mixture of sp2 (graphite) & sp3 (diamond) phases. 

Control of film properties is strongly dependent on the flux characteristics of the chosen deposition technique (PVD sputter or evaporation and Pa-CVD), metal and hydrogen content within the film, sp2:sp3 ratio, substrate bias voltage, ion energy and ion density as well as substrate temperature. 

DLC film friction coefficient against steel generally ranges from 0.05-0.20, whilst film hardness and sp3 content can be tailored for specific applications.

Metal and hydrogen containing DLC (Me-DLC or a-C:H:Me) exhibit hardness in the range 500-2000HV with 35% sp3, metal free DLC

(C-DLC or a-C:H) typically 1500-4000HV and up to 75% sp3 , whilst tetrahedral amorphous carbon (ta-C) can be 4000-9000HV with 80-85% sp3.

Pulse Plasma Carbon Gun
Head of plasma carbon gun
Pulse Plasma Carbon Gun ISO200
3 - Pulse Plasma Carbon Guns
Pulse Plasma Carbon Gun
Power supply of Pulse Carbon Gun
Power supply of Pulse Carbon Gun

Set of Pulse Plasma Carbon Gun

Description:

  • Pulse Plasma Carbon Gun ISO200

  • Capacitors Unit

  • Power supply

  • 32 sets of Graphite parts

Spear parts

  • Anode

  • Ignition Unit

  • Ceramic parts

                                                             

Power supply:

Accumulator charging voltage 100 ÷ 350 V

Auxiliary anode supply voltage 300 V

3 points initialization pulse voltage amplitude 500 V

Initialization pulse frequency

(for capacitive accumulator of 2000 uF) 1 ÷ 20, step 1 Hz

Max pulses quantity per cycle 1 ÷ 999999

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